The Hindu Business Line : Synopsys, Nikon to collaborate

Synopsys Inc, leading semiconductor design software company, and Nikon Corporation, a supplier of lithography equipment for microelectronics manufacturing announced on Thursday that they would be collaborating on development and delivery of advanced lithography software models and DFM enabled lithography manufacturing solutions for 45 nanometer and below.

The collaboration would bring together EDA design and optical lithography imaging system expertise to focus on building next generation "manufacturing-aware" OPC and RET lithography simulation models. At 45 nm and below, critical dimension control will be at the single nanometer levels pushing current OPC/RET models and optical lithography system performance to the extreme limits.

Early work will focus on the development and optimisation of new advanced lithography simulation models, which can intelligently capture the Nikon lithography system's proprietary signatures. "At 45 nanometers and below, the characterisation and integration of both design and manufacturing information is essential," said Mr Anantha Sethuraman, Vice-President of DFM Solutions at Synopsys.

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